Semiconductors could be termed as the most extensively utilized substance in the modern century. Polycrystalline wafers are used to make semiconductors. A single 300-mm silicon wafer may create hundreds of chips. Photoresist coatings and materials are an essential part of their fabrication as they are the main constituents of the photolithography process during the fabrication of the semiconductors. Photoresist is a mixed liquid that is sensitive to light. Its components include: photoinitiators (including photosensitizers, photoacid generators), photoresist resins, monomers, solvents and other additives. The photoresist can transfer the required fine pattern from the photomask (mask) to the substrate to be processed through photochemical reaction and photolithography processes such as exposure and development.
Hydrogen storage materials are materials which can store and release hydrogen gas. These materials are important for the development of hydrogen fuel cell technology, as they allow for the safe and efficient storage of hydrogen. There are several types of hydrogen storage materials, including: 1. Sorbent Materials. Carbon-based materials such as nanotubes, fullerenes, graphene, mesoporous silica, metal-organic frameworks (MOFs), isoreticular metal-organic frameworks (IRMOFs), covalent-organic frameworks (COFs), and clathrates belong to this category. 2. Complex Hydrides. These consist of light metal hydrides and chemical hydrides. 3. Nanostructured materials. These are composed of functionalized sorbent materials as well as nanoparticles of complex hydrides. The development of efficient and cost-effective hydrogen storage materials is crucial for the widespread adoption of hydrogen fuel cell technology.