Nombre del producto:Octahydro-1H-4,7-methanoinden-5-yl methacrylate

IUPAC Name:tricyclo[5.2.1.0²,⁶]decan-8-yl 2-methylprop-2-enoate

CAS:34759-34-7
Fórmula molecular:C14H20O2
Pureza:95%
Número de catálogo:CM268891
Peso molecular:220.31

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CM268891-100g in stock ŗů
CM268891-500g in stock IJľŹ
CM268891-1000g in stock ȃŗľ

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Detalles del producto

Núm. De CAS :34759-34-7
Fórmula molecular:C14H20O2
Punto de fusión:-
Código de sonrisas:CC(C(OC1C(C2)C3CCCC3C2C1)=O)=C
Densidad:
Número de catálogo:CM268891
Peso molecular:220.31
Punto de ebullición:
Nº Mdl:
Almacenamiento:

Category Infos

Photoresist
Semiconductors could be termed as the most extensively utilized substance in the modern century. Polycrystalline wafers are used to make semiconductors. A single 300-mm silicon wafer may create hundreds of chips. Photoresist coatings and materials are an essential part of their fabrication as they are the main constituents of the photolithography process during the fabrication of the semiconductors. Photoresist is a mixed liquid that is sensitive to light. Its components include: photoinitiators (including photosensitizers, photoacid generators), photoresist resins, monomers, solvents and other additives. The photoresist can transfer the required fine pattern from the photomask (mask) to the substrate to be processed through photochemical reaction and photolithography processes such as exposure and development.

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