cas 31645-35-9|| where to buy Anthracen-9-ylmethyl methacrylate

Nombre del producto:Anthracen-9-ylmethyl methacrylate

IUPAC Name:(anthracen-9-yl)methyl 2-methylprop-2-enoate

: CAS：31645-35-9; Fórmula molecular：C19H16O2; Pureza：95%

: Número de catálogo：CM283052; Peso molecular：276.34

Unidad de embalaje	Stock disponible	Precio($)
CM283052-10g	in stock	ǶǶ
CM283052-25g	in stock	ƿƿŵ
CM283052-100g	in stock	ȡȡǶ

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Detalles del producto

: Núm. De CAS :31645-35-9; Fórmula molecular:C19H16O2; Punto de fusión:-; Código de sonrisas:CC(C(OCC1=C2C=CC=CC2=CC3=CC=CC=C13)=O)=C; Densidad:

: Número de catálogo:CM283052; Peso molecular:276.34; Punto de ebullición:443°C at 760 mmHg; Nº Mdl:MFCD00673247; Almacenamiento:Store at 2-8°C.

Category Infos

: Anthracenes; Anthracene is a condensed aromatic hydrocarbon containing three rings. The center of the three rings of anthracene is in a straight line, which is the isomer of phenanthrene. The chemical activity of the 9 and 10 positions in the anthracene molecule is relatively high. It is oxidized with nitric acid to generate 9, 10-anthraquinone, which is an important intermediate for the synthesis of anthraquinone dyes. Anthracene can also act as a conjugated diene in a Diels-Alder reaction with maleic anhydride.

: Photoresist; Semiconductors could be termed as the most extensively utilized substance in the modern century. Polycrystalline wafers are used to make semiconductors. A single 300-mm silicon wafer may create hundreds of chips. Photoresist coatings and materials are an essential part of their fabrication as they are the main constituents of the photolithography process during the fabrication of the semiconductors. Photoresist is a mixed liquid that is sensitive to light. Its components include: photoinitiators (including photosensitizers, photoacid generators), photoresist resins, monomers, solvents and other additives. The photoresist can transfer the required fine pattern from the photomask (mask) to the substrate to be processed through photochemical reaction and photolithography processes such as exposure and development.

: Bottom Anti-Reflective Coating (BARC)

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