Nombre del producto:4-vinylphenol

IUPAC Name:4-ethenylphenol

CAS:2628-17-3
Fórmula molecular:C8H8O
Pureza:95%
Número de catálogo:CM184728
Peso molecular:120.15

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CM184728-100g in stock ſȷ
CM184728-500g in stock Ȧƙɐ

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Detalles del producto

Núm. De CAS :2628-17-3
Fórmula molecular:C8H8O
Punto de fusión:-
Código de sonrisas:OC1=CC=C(C=C)C=C1
Densidad:
Número de catálogo:CM184728
Peso molecular:120.15
Punto de ebullición:206.2°C at 760 mmHg
Nº Mdl:MFCD00017593
Almacenamiento:Store at 2-8°C.

Category Infos

Photoresist
Semiconductors could be termed as the most extensively utilized substance in the modern century. Polycrystalline wafers are used to make semiconductors. A single 300-mm silicon wafer may create hundreds of chips. Photoresist coatings and materials are an essential part of their fabrication as they are the main constituents of the photolithography process during the fabrication of the semiconductors. Photoresist is a mixed liquid that is sensitive to light. Its components include: photoinitiators (including photosensitizers, photoacid generators), photoresist resins, monomers, solvents and other additives. The photoresist can transfer the required fine pattern from the photomask (mask) to the substrate to be processed through photochemical reaction and photolithography processes such as exposure and development.