Semiconductors could be termed as the most extensively utilized substance in the modern century. Polycrystalline wafers are used to make semiconductors. A single 300-mm silicon wafer may create hundreds of chips. Photoresist coatings and materials are an essential part of their fabrication as they are the main constituents of the photolithography process during the fabrication of the semiconductors. Photoresist is a mixed liquid that is sensitive to light. Its components include: photoinitiators (including photosensitizers, photoacid generators), photoresist resins, monomers, solvents and other additives. The photoresist can transfer the required fine pattern from the photomask (mask) to the substrate to be processed through photochemical reaction and photolithography processes such as exposure and development.
Silanes are a series of silicon substitutes for carbon alkanes, which consisting of multiple silicon atoms linked to each other as the main chain and hydrogen atoms or other chemical elements linked with the main chain. Silanes are versatile chemicals used in the modification of SPR sensor surfaces. In particular, the silane molecules, such as 3-mercaptopropyl trimethoxy silane, are convenient for use as linkers in surface modification of SPR sensors.
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